The MA-110365 Alignment System is optimized for highest throughput and most accurate print gap settings.The equipment enables researches to create micrometer patterns in different substrates in many projects which needs to align micro structure layers together. The tool supports a variety of standard lithography processes, such as vacuum and contact exposure mode. It accommodates wafers and substrates up to 4 inches, varying in size, shape and thickness. The system contains uniform lighting system with UV100 source which leads to highly accurate alignment with high resolution prints down to 2 μm. With these features MA-110365 targets applications in MEMS, Compound Semiconductor, Power Devices and Nanotechnology.
Table of Specification
| Mask aligner models | FEATURES | |||||
| MA-110365 | MA-210405 | |||||
| 1-2-3-4 inch | 1-2-3-4 inch | Sample size (inch) | ||||
| 1-2-4 | 1-2-4 | Mask size (inch)
(Three mask holders) |
||||
| 350–380nm | 350–380nm | wavelength | Exposure System | |||
| UV100 | UV100 | power | ||||
| 4 inch | 4 inch | Beam size | ||||
| Auto | Semi Auto | Exposing process | ||||
| 2µm | 2µm | Minimum Feature size (Positive Tone Resist) | ||||
| Top-side (TSA) | Top-side (TSA) | Alignment methods | ||||
| 3µm | XY- alignment stage resolution | |||||
| 7.5± | X | Alignment range (mm) | ||||
| 7.5± | Y | |||||
| 10 | Z | |||||
| 10 deg± | Ѳ | |||||
| 100*80 | Optical Scanning movement
XY(mm*mm) |
|||||
| 80*110 | Full field
XY(mm*mm) |
TSA microscope stage (joystick) | ||||
| Loop | Lens | |||||
| 1-5 mm/s | scanning speed (Joystick | |||||
| 100*100 | Maximum Mask size ( mm×mm)
Note: for other sizes please contact us. |
|||||
| 0.9-2 cm | Optical Working distances | |||||
| 0.5-1-3-4 inch | Vacuum chunk for samples | |||||
| Vacuum, Pneumatic-auto | Vacuum, Pneumatic | Mask and sample holding mechanism | ||||
| Damping base | Anti-vibration platform | |||||
| software, Controls, CD, Windows®(for Double side aligner models) | PC and software | |||||
Use and Maintenance
Lithography must be done in cleanroom.
When placing the specimen or mask inside the device, be sure to use gloves and prevent any dirt inside the compartment.
Before exposure, make sure the vacuum pump is switched on and the sample is kept on the holder.
Safety and Packing
During exposure, be sure to wear UV-protective glasses and do not stare at all.
When working, keep your hair, hands and clothes away from mechanical parts.
Do not wet the instrument’s electrical parts.
Avoid moving the device when the lamp is still hot.