The system enables researches to create micrometer patterns in different substrates in many projects. The equipment supports a variety of standard lithography processes, such as vacuum and contact exposure mode. The system contains uniform lighting system with UV100 source which leads to high resolution feature size down to 2 μm.
Table of specification
| Sample Size (inch) |
1-2-3 inch |
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| Mask Size (inch) | 1-2-3 | ||
| Exposure System | Wavelength | 365–400 nm | |
| Power | UV-100 | ||
| Beam size | 4 inch | ||
|
Minimum Feature size |
2µm |
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| Maximum Mask size
mm×mm |
85*65 | ||
| Vacuum chunk for samples |
1-2-4 inch |
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| Mask holding mechanism | Auto | ||
| Sample loading mechanism |
Auto |
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| Lithography process | Semi-auto | ||
Use and Maintenance
- Lithography must be done in cleanroom.
- When placing the specimen or mask inside the device, be sure to use gloves and prevent any dirt inside the compartment.
- Before exposure, make sure the vacuum pump is switched on and the sample is kept on the holder.
Safety and Packing
- During exposure, be sure to wear UV-protective glasses and do not stare at all.
- When working, keep your hair, hands and clothes away from mechanical parts.
- Do not wet the instrument’s electrical parts.
- Avoid moving the device when the lamp is still hot.