Reduction lithography Unit

In this system the mask pattern is projected onto the substrate by means of an optical system between the mask and the substrate; enabling researchers to generate photomasks with much lower minimum feature size than printed masks. Highly accurate reduction unit used in ARL5 -ARL7offers the greatest advantage in processes requiring high resolutions and achieves resolutions down to 1 µm.

Read More

Desktop Lithography

The system enables researches to create micrometer patterns in different substrates in many projects. The equipment supports a variety of standard lithography processes, such as vacuum and contact exposure mode. The system contains uniform lighting system with UV100 source which leads to high resolution feature size down to 2 μm. Table of specification Sample Size (inch) 1-2-3 inch Mask Size (inch) 1-2-3 Exposure System Wavelength 365–400 nm Power UV-100 Beam…

Read More

double side optical mask aligner

The new MAB Model 110365 front and backside mask aligner system offers advanced features and specifications found most often in costly automated production mask aligners. With the development of this new mask aligner, AMS meets the growing challenge of a dynamic semiconductor and MEMS market. The system contains uniform lighting system with UV100 source  and  high resolution top and bottom side split field  microscopes which lead to highly fast and…

Read More

Coating Process Unit

An other important advancements by AMS Group in the lithography space include the company’s special Coating Process Unit. This system not only integrates coating and baking platform but, ultimately,  accommodate the processing of an extensive range of materials such as positive and negative resists, coating of thin resist layers and high viscosity resists. Conformal layers of photoresist or polymers are achieved on wafers  with AMS’s advanced coating technology. This ensures…

Read More

Single side optical mask aligner

The MA-110365 Alignment System is optimized for highest throughput and most accurate print gap settings.The equipment enables researches to create micrometer patterns in different substrates in many projects which needs to align micro structure layers together. The tool supports a variety of standard lithography processes, such as vacuum and contact exposure mode. It accommodates wafers and substrates up to 4 inches, varying in size, shape and thickness. The system contains uniform lighting system…

Read More

Semi-automatic lithography rack

Our company offers ALR 365 Semi-automated  System for integrating exposure system, spinner and heater in one device and enables customers to realize significantly reduced fabrication costs. Automated system provides fully integrated and highly automated production systems for lithography. The system contains uniform lighting system with UV100 source which leads to high resolution feature size down to 2μm. Table of specification Technical data: Coating Process Unit 1-2-3-4 inch Sample size (inch) Vacuum…

Read More